Simulation of Semiconductor Processes and Devices 1998: SISPAD 98 by Kristin De
215,90 €
Subtitle SISPAD 98. TCAD in SRC. - TCAD in Selete. - Integration of Lithography and Etch Simulations. - Modeling of Flow and Heat Transfer in a Vertical Reactor for the MOCVD of Zirconium-Based Coatings.
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